No, we certainly do not need to perform thermal oxidation before every lithography step. We can perform lithography an any substrate. We may have to prepare the substrate using an adhesion promoter, or possibly an antireflection coating before applying the photoresist.
Suppose, While doing oxidation we are growing SiO2 layer on both sides (top and bottom). During buffer oxide etching of top oxide for ion implantation, how can we protect the back oxide from getting etched?
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Hi Dr.Chris Mack
What is the role of a silicon carbide straight-through tube in a horizontal furnace?
Thank you sir for your explanation!
Do we need to perform thermal oxidation before every lithographic process?
Will SiO2 layer provide better adhesive to the photo resist layer?
No, we certainly do not need to perform thermal oxidation before every lithography step. We can perform lithography an any substrate. We may have to prepare the substrate using an adhesion promoter, or possibly an antireflection coating before applying the photoresist.
Thanks a lot for your reply :)
Your videos are really good
Suppose, While doing oxidation we are growing SiO2 layer on both sides (top and bottom). During buffer oxide etching of top oxide for ion implantation, how can we protect the back oxide from getting etched?
I think the most common approach would be to coat the backside with photoresist.
Thankyou .
very slow
go wherever you came from and you will find a person speaks fast
Professor Mack said most students prefer playing the videos at 1.5x, so do I. Helps, but sometimes you might need to slow down and rewind a bit
Very good.