Double Patterning to the rescue (Self Aligned Double Patterning) - Part 2
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- Опубликовано: 5 сен 2024
- Introduction to Double Patterning which is used extensively for printing transistors and other features in front end of line (FEOL) flow in a semiconductor chip.
This video talks about patterning of transistors in a SRAM cell and why Self Aligned Double Patterning is preferred for patterning the fins for an FinFET transistor.