TRUMPF EUV lithography - This all happens in one second
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- Опубликовано: 5 фев 2019
- Further information: www.trumpf.com/s/euv
With the increasing global digitalization, requirements for computer performance continue to grow. The result: Chips have to be smaller and more efficient, which is why many more transistors have to fit on semiconductors. With EUV lithography, TRUMPF, in partnership with ASML and Zeiss, has developed a cost-efficient and mass-suitable process, during which the wafers are exposed to extreme ultraviolet (EUV) light at a wavelength of 13,5 nanometers. By this means, efficiency and profitability of production for chip manufacturers are increased. TRUMPF produces the laser pulse for the process, which is needed for the generation of EUV radiation. Therefore we developed an own, pulse-capable high-performance CO2 laser system - the TRUMPF Laser Amplifier.
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Weitere Informationen: www.trumpf.com/s/euv
Mit der zunehmenden Digitalisierung der Welt steigen die Anforderungen an die Computerleistung unaufhörlich. Die Folge: Die Chips müssen leistungsfähiger und kleiner werden, weshalb auf den Halbleitern immer mehr Transistoren Platz finden müssen. Mit der EUV-Lithografie hat TRUMPF partnerschaftlich mit ASML und Zeiss ein kosteneffizientes und massenfähiges Verfahren entwickelt, bei dem durch extrem ultraviolettes (EUV-) Licht mit einer Wellenlänge von 13,5 Nanometern die Wafer belichtet werden. Für die Chiphersteller erhöhen sich auf diese Weise die Effizienz und Wirtschaftlichkeit ihrer Produktion. TRUMPF erzeugt für den Prozess den Laserpuls, der für die Generierung der EUV-Strahlung benötigt werden. Hierfür hat das Unternehmen ein eigenes pulsfähigen Höchstleistungs-CO2-Lasersystem entwickelt - den TRUMPF Laser Amplifier. 
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Höchsten Respekt an die Forscher, Ingenieure und Mitarbeiter. Wahnsinn. Danke ❤
Totally awesome visualisation and surprisingly accurate as well! Makes me proud to be part of this technology at ASML.
Would be nice knowing what each phase represents and why, like why light bounces so many times in 2 chambers and so on also what happens to it there
@@taith2 It's called chirped pulse amplification. The pulses are time-stretched, or chirped as they call it, them amplified by passing them through multiple stages of optically pumped amplification crystals and then recompressed to produce a much stronger pulse than the original pulse coming out of the CO2 laser.
@@douro20 may I know what is the repetition rate and average energy of the laser is. And ofcourse the pulse duration ?
@@sainadh7 Unfortunately I can't answer that.
of course it's surprisingly accurate. They literally invented this technology
Top Video und grandiose Leistung sowas zu entwickeln!
Now this is a real MODERN ART
Ich blieb 1,38 Minuten mit offenem Mund, Top Video!
peinlich
"Folks 👌, let me tell you about the Trumpf EUV machine - it’s unbelievable, a tremendous machine, it's great. No one makes these machines better than me, believe me. And let me tell you, China, they wish they could get their hands on technology like this. But we’re keeping it right here, making our tech industry stronger and better than ever before."
Gold
Unless they build their own.
@@sumitverma5734Damn, they did.
This is a good way to attract talent, hope more companies follow the suit
Amazing visualisation ! Great work !
that was gorgeous! this technlogy is really based on the edge of know physics!
I'd like more videos and information about this, it's awesome.
Truly amazing technology.
so touching, the highest level tech and video.
best partner for ASML
Question 1: Why the plasma (EUV) light is generated as a second process (by vaporizing tin droplets) and not directly by the laser itself ?
Question 2: The powerful laser was developed by US Cymer or German Trumpf ? What about all the optics ? All are German Carl Zeiss, right ?
Thank you.
Hello Martin,
Answer 1: Lasers can only operate efficiently for certain wavelengths, determined by the choice of the laser gain medium. There is no efficient gain medium for short wavelength EUV radiation. There is research to overcome this challenge, but currently concepts such as the free-electron laser are far from ready to be used - hence the plasma process.
Answer 2: The high-power laser from TRUMPF for the EUV light source and the optical system from ZEISS are key components of the EUV lithography machines.
Best regards,
Your TRUMPF Team
@@TRUMPFtube too bad about your name, do people assume you are associated with the buffoon?
Plus with the limitations they just described for the gain media, you are going to get better "resolution" generating the plasma another way
Probably the second-most complicated way to generate light (after a synchrotron). Wonder what the luminosity of this EUV source is compared to what ESRF, APS, or SPring-8 can generate
😊 Extremely Interesting sand thank you so much for the video.
Kooles Video und beste Grüße aus Wetzlar 😉
Cool video, but at least one technical error. When the main pulse hits the droplet is not in spherical form anymore, the pre-pulse hit turns it into a flat target.
Dear K Long,
you are right that the video is not to 100% technically correct at the point where the main pulse hit the droplet. It’s a balancing act between technical correctness and impressive visual realization.
Best regards your TRUMPF Team
...and probably also protecting certain IP rights:)
@@TRUMPFtube Dear sir， how can I contact you on RUclips, I want to share your video at other video website, and need your confirm, please send me a reply thanks
They also got the speed of light wrong :D
Hologram makers have a lot cool tricks…
Sehr gutes Videos!
I don't understand why this video has thumbs down at all. It's amazing what you guys are doing there. I cent wait to have your chips in my pocket ♡
Because Trumpf.
@@user-pn8dq6vt4s exactly idoits triggered by the T word
Nice
This is where reality is more unbelievable than science fiction...
Trumpf 2020! Making ASML great again!
Hahah....
Reading chip war...happy to get this hillarious quip
Perfect technology
Great technology for the good of mankind
World’s most advanced lightbulb
Its like taking making x-rays to a whole new level, we haven't understood how to make it beyond hammering a piece of tungsten, inefficient but its all we got, just like this. Yes we might have improved upon it by adding spinning tungsten disks to make better x-ray tubes, but core principle had not changed.
真的漂亮！
Amo trabalhar com essa máquina
Queria um uniforme da trumpf
They had to do this to get around having to build a big particle accelerator to produce the light. The downside is that the collector will eventually become contaminated with enough tin to reduce the efficiency of light generation to the point where it will have to be replaced.
I’m sure there’s a maintenance procedure involved
What other light sources are there? Could EUV produced by other plasma generating sources work such as a fusion device? Or is there a technical barrier?
@@robertFat804X-ray free electron lasers have been discussed as a possible light source.
@@robertFat804 Free-electron lasers are being discussed as an alternative. There's a compact EUV FEL being developed by Lyncean Technologies- it actually uses two coupled EUV FELs with an electron storage ring to greatly optimise the amount of EUV light produced.
@@robertFat804Accelerator collider.
Can i ask who produced this video?
What does tin droplet finally become after get hit by those two
How many tons of tin is required for an average euv machine? I understand you recycle the tin but I am not sure how many tons are in each machine. Thanks
ASML Cymer has published an approximate tin droplet diameter of ~30 µm (ruclips.net/video/5yTARacBxHI/видео.html). Using this droplet diameter and the repetition rate of 50kHz, you can calculate the usage of tin per machine and year.
Es gibt eine Hand voll Menschen die denken, forschen und bauen wahnsinnige Maschinen.
Und es gibt Menschen, die froh sind, ihren eigenen Namen fehlerfrei schreiben zu können, den ganzen Tag RTL2 gucken und ihr Home Entertainmentsystem nutzen - ohne dabei die leiseste Ahnung zu haben, was eigentlich für eine irre Technologie nötig ist, dies alles Realität werden zu lassen... Der Mensch verblüfft immer wieder...
so if the 2end pulse does the vaporizing than whats the first blue pulse for?
The first pulse turns the drops into wafer-thin "slices". The second pulse heats it to 220,000 ° Celsius, which is 40 times hotter than the surface of the sun. The tin evaporates into plasma, which releases the EUV radiation.
@@TRUMPFtube can I ask what the wavelength of each of the pulses is?
@@TRUMPFtube🤯🤯🤯
❤
Isn't EUV light source is monopolized by Cymer Inc?
Thank you for the question. The EUV laser system is made by TRUMPF. And only by TRUMPF. 💥
@@TRUMPFtube But the US says its Cymer Inc. is the inventor of ASML EUV light source.
TRUMPFtube... an unfortunate name these days. The video was incredible though!
do you want to beat ASML？
Dear 王冠群, no, quite to the contrary, we work together. TRUMPF delivers the laser system which ASML integrates. Only together we are able to take the next step in photolithography. Your TRUMPF Team
@@TRUMPFtube That's the best idea instead of plagiarize
I don't understand how often they have to hit the tin?
Dear dieselphiend, here is the explanation: In a vacuum chamber, a droplet generator shoots 50,000 tiny tin droplets per second. Each of these droplets is hit by one of the 50,000 laser pulses and turned into plasma. This produces EUV light, which is directed by a mirror onto the wafers to be exposed. The laser pulse for the plasma radiation is provided by a pulsable CO2 laser system developed by TRUMPF - the TRUMPF Laser Amplifier. Best regards Your TRUMPF Team
@@TRUMPFtube That's so incredible. I wonder how they shoot little molten droplets of tin that frequently.
@@TRUMPFtube cool. Why?
@@Moonman1823 To put it simply, to generate EUV light (for lithography). Each droplet is first hit by the pre-pulse, which deforms it into a pancake and makes it a better target for the main pulse, which converts the tin into plasma, releasing a tiny burst of EUV light. Ideally the source would generate as much light as possible and do so continuously, so the process is repeated thousands of times per second.
At the very least they have to hit it twice. Once with a "pre-pulse" which forms the droplet into a little concave disk. Then the main pulse hits which is what actually generates the EUV light.
How much
มนฺอยู่ในคอนโทรลนักคิดนักสร้าง เหมือนจิตเขาทุกๆนักคิดค้นอยู่ในนั้น.
looks very cool but i still don't know what#s happening lol
Maybe our landing page can help: www.trumpf.com/en_INT/solutions/applications/euv-lithography/
Easy BUT what happens when it hits the TIN DROP is what I wanna know
The tin changes into a plasma. Part of the energy of stripping away the elections is emitted as the UV light they are trying to generate (2% I think).
This uv is captured by special mirrors and directed away for use on the etching process.
The tin droplet gets vaporized and excited into a plasma state which emits a heck of a lot of 13.5nm light which is what they need for EUV lithography.
I didn't understand a single second of this video.
Essentially they are using a high energy laser to vaporize tin droplets into plasma to generate high intensity UV light. This light is used to print the circuit traces on computer chips. The Tin droplet has to be hit twice by the laser, first in a "pre-pulse" to form the droplet into a concave disk for better conversion efficiency, then the main pulse hits, vaporizing and exciting the tin disk into a plasma which emits EUV light.
Vom Rad zu sowas…
abnormal wenn man so drüber nachdenkt
what am i looking at
You are looking at how state of the art-ly chip manufacturers are generating extreme UV light to expose their chip wafers for all kind of computer chips particularily for CPUs and GPUs.
Here is the explanation of what you see in the vid: In a vacuum chamber a droplet generator shoots 50,000 tiny tin droplets per second. Each of these droplets is hit by one of the 50,000 laser pulses and turned into plasma. This plasma produces EUV light which is directed by a mirror onto the wafers to be exposed. The laser pulse for the plasma radiation is provided by a pulsable CO2 laser system developed by TRUMPF - the TRUMPF Laser Amplifier.
@@haraldschurr1035 Thank you for the reponse, that definitely helped me understand a bit better. :)
@@JkaneFilms fine - you're welcome.
14 year-olds must love this video.
ok boomer
MAGA
Visuals are stunning, however the sounds are very cartoonish. You need to make better sounds for the events and it should feel more technological.
I loved the sounds and the music.
lame i still have no idea how it works... and lame sound effects