Beautifully explained. Concise, no fluff at all, beautiful clarity. This series was one of the best explanations yet for the optics/imaging side of lithography. Would be great if Zeiss releases a series on the actual manufacture & design of the lens elements/mirrors used in modern scanners.
I am speechless. I didn't know what I didn't know. The SALE and the 3d integration is nuts! Fantastic presentation. I worry that should another dark age happen, these crucial techniques will be lost.
Once again thanks a lot for this incredible educational video serie. Until now lithography is the standard in the semicon. At the end of this episode mr Bernd Geh talked about future steps. Are there also future steps non-lithographic thinkable. For example the former Dutch company Mapper had an maskless approach and instead of uv light they used electron beams. Is it possible to make future steps with another technologies? Or is the lithographic way the only way. Mapper is bankrupt, as you probably know. But ASML bougth the intellectual propeties.
Dear Aad, ZEISS is a technology leader in lithography optics and will push forward this technology as far as possible. Alternative semiconductor manufacturing technologies are nanoimprint, multi-electron beam and directed self-assembly. Our experience in the field of semiconductor manufacturing technologies has shown that it is always possible to push the limits of what is physically possible and one never can say that something is not possible. Mapper was a maskless technology, but it’s still Lithography. The photo resist is exposed with electron beams. One of the advantages of using light instead of charged particles (electrons or ions) is the fact that photons don’t repel each other in the way that charged particles do. In order to print many small things very fast, photons - being Bosons - have a huge advantage. Nanoimprint and directed self-assembly are successfully used for a few niche applications, but productivity and defectivity have to date not been shown a viable and economic alternative to optical lithography in high volume manufacturing. Non lithographic ways to achieve a higher transistor area density are methods like pitch doubling or 3D stacking of devices. We think that both, continued shrink enabled by optical lithography, as well as 3D stacking and more advanced packaging schemes are the path into the future - to make microchips smaller, more powerful, more energy-efficient and more affordable.
@@zeissgroup Thank you very much for this detailed answer. I appreciacte this a lot. I think you are right with regards to the limits of what is physically possible and one never can say that something is not possible. Zeiss SMT proved that they are world class (Spitzenklasse). Mapper's technology is based on lithography as well. You are completely right of course. Due to the fact that I work for a Dutch system supplier I am interested a lot in the semicon market. We supply a lot to ASML, but also Zeiss IMT in Oberkochen. In the past I did also projects for Zeiss SMT and -NTS. I am still proud of that, because I love the hightech industry. Last but not least, the holding I am working for did buy Zeiss Prontor. I hope I don't bother you with my side of the story. Once again thank you for the answers. For me it was highly educational. Wish you all the best in the near futher...all the best pushing boundries forward!
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Beautifully explained. Concise, no fluff at all, beautiful clarity. This series was one of the best explanations yet for the optics/imaging side of lithography.
Would be great if Zeiss releases a series on the actual manufacture & design of the lens elements/mirrors used in modern scanners.
No chance, billions was spent to develop those. None will be given out for free
I am speechless. I didn't know what I didn't know. The SALE and the 3d integration is nuts! Fantastic presentation. I worry that should another dark age happen, these crucial techniques will be lost.
Thanks Bernd! Great series.
2:21 SALE2
3:42 Direct Self Assembly
4:28 3D
6:45 1 Transistor
Thank you for sharing this information with us in such a concise, clear manner! Cheers from California
Awesome series. Very valuable and useful information and quality presentation.
Once again thanks a lot for this incredible educational video serie. Until now lithography is the standard in the semicon. At the end of this episode mr Bernd Geh talked about future steps.
Are there also future steps non-lithographic thinkable. For example the former Dutch company Mapper had an maskless approach and instead of uv light they used electron beams.
Is it possible to make future steps with another technologies? Or is the lithographic way the only way. Mapper is bankrupt, as you probably know. But ASML bougth the intellectual propeties.
Dear Aad,
ZEISS is a technology leader in lithography optics and will push forward this technology as far as possible. Alternative semiconductor manufacturing technologies are nanoimprint, multi-electron beam and directed self-assembly. Our experience in the field of semiconductor manufacturing technologies has shown that it is always possible to push the limits of what is physically possible and one never can say that something is not possible.
Mapper was a maskless technology, but it’s still Lithography. The photo resist is exposed with electron beams. One of the advantages of using light instead of charged particles (electrons or ions) is the fact that photons don’t repel each other in the way that charged particles do. In order to print many small things very fast, photons - being Bosons - have a huge advantage. Nanoimprint and directed self-assembly are successfully used for a few niche applications, but productivity and defectivity have to date not been shown a viable and economic alternative to optical lithography in high volume manufacturing. Non lithographic ways to achieve a higher transistor area density are methods like pitch doubling or 3D stacking of devices. We think that both, continued shrink enabled by optical lithography, as well as 3D stacking and more advanced packaging schemes are the path into the future - to make microchips smaller, more powerful, more energy-efficient and more affordable.
@@zeissgroup Thank you very much for this detailed answer. I appreciacte this a lot. I think you are right with regards to the limits of what is physically possible and one never can say that something is not possible. Zeiss SMT proved that they are world class (Spitzenklasse).
Mapper's technology is based on lithography as well. You are completely right of course. Due to the fact that I work for a Dutch system supplier I am interested a lot in the semicon market. We supply a lot to ASML, but also Zeiss IMT in Oberkochen. In the past I did also projects for Zeiss SMT and -NTS. I am still proud of that, because I love the hightech industry. Last but not least, the holding I am working for did buy Zeiss Prontor.
I hope I don't bother you with my side of the story. Once again thank you for the answers. For me it was highly educational. Wish you all the best in the near futher...all the best pushing boundries forward!
incredibly well explained
Thank you for all the lecture series about lithography.. love from Germany..
Thanks for this insightful series.
Are they allowed to broadcast the fact they FIB other company's structures ?
It's their customers too. Not that every competitor hasn't already
6:45 Many modern flash chips (especially consumer) store multiple bits in one cell (MLC, TLC, QLC...).
Thank you, this was very insightfull when trying to find answers on how you get from CPU to pixel. Really multidimensional
Tolle Übersicht, vielen Dank!
It's crazy to think I have chips made using this technology on a phone in my pocket that does incredible things.
Thanks a lot.
Thank you!
it was awesome
Nice to see even Zeiss need to reverse engineer Korean technologies