Hey man, nice videos and a very nice lab. I have a couple of questions you may answer. Did you had any problems with the phosphoric acid type doping? I also heard that boric acid can be used as dopant, just don't know what solvent to use, any luck with this? I have some P type and N type wafers and i have noticed something weird. P type wafers when dipped in HF just to remove the oxide, then measured with a DMM on diode mode, they seem to conduct, there is like a 0.1 to 0.8v drop. Now, the interesting thing is that N type wafers don't conduct when tested the same way. I had some other N type wafers and now they conduct the same way as the P type. I tested them with the hot probe test. Maybe there was something done to them differently so they behave like that...i don't know.
Doping with phosphoric acid is a little difficult, there are a few tricks I can share with you. Let me know more about your process so I can help, email me at sam @ zeloof . xyz
It's a silicon chip that's in the process of being turned into an integrated circuit. Part of the process of etching the actual transistor patterns into the chip involves coating it with photoresist (stuff that hardens when exposed to light), using a projector to shine a pattern on it and develop the photoresist, and then using something like acid to etch patterns in the parts of the chip where the photoresist didn't harden to protect it. But once you've finished the etching, you still have to clean the rest of the photoresist off, *very thoroughly*. That's what this device is for, using oxygen plasma to eat it.
Absolutely, awesome, as always! How can I go about replacing my neighbors with folks like yourself?
in my university's physics lab as a student i actually did a bunch of experiments with inductively coupled plasma. looked exactly like that.
What is that plasma source, Icp? Or microwave?
Hey man, nice videos and a very nice lab. I have a couple of questions you may answer.
Did you had any problems with the phosphoric acid type doping?
I also heard that boric acid can be used as dopant, just don't know what solvent to use, any luck with this?
I have some P type and N type wafers and i have noticed something weird.
P type wafers when dipped in HF just to remove the oxide, then measured with a DMM on diode mode, they seem to conduct, there is like a 0.1 to 0.8v drop. Now, the interesting thing is that N type wafers don't conduct when tested the same way. I had some other N type wafers and now they conduct the same way as the P type. I tested them with the hot probe test. Maybe there was something done to them differently so they behave like that...i don't know.
Doping with phosphoric acid is a little difficult, there are a few tricks I can share with you. Let me know more about your process so I can help, email me at sam @ zeloof . xyz
I've sent you an email, maybe it went to spam?
What chemical are you using for your photo resist?
AZ 4210
Really cool
Is one end of the coil is RF and other is ground right?
Great job!! Good little entertaining, science vid, I like.. What did you use to ignite the plasma?
I used a 100watt HF ham radio connected to the coil
What the equipment have you used?
smart. you'll have a gate(s) in no time
I have more questions than anyone would care to answer about this, but, what is that shard of material? And what is it for?
It's a silicon chip that's in the process of being turned into an integrated circuit. Part of the process of etching the actual transistor patterns into the chip involves coating it with photoresist (stuff that hardens when exposed to light), using a projector to shine a pattern on it and develop the photoresist, and then using something like acid to etch patterns in the parts of the chip where the photoresist didn't harden to protect it.
But once you've finished the etching, you still have to clean the rest of the photoresist off, *very thoroughly*. That's what this device is for, using oxygen plasma to eat it.